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Publications by Mark W. Kelly
Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas
Journal of Physical Chemistry A
Medicine
Theoretical Chemistry
Physical
Related publications
Synthesis and Mechanical Wear Studies of Ultra Smooth Nanostructured Diamond (USND) Coatings Deposited by Microwave Plasma Chemical Vapor Deposition With He/H2/Ch4/N2 Mixtures
Diamond and Related Materials
Electronic Engineering
Astronomy
Mechanical Engineering
Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Chemistry
Electronic
Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD
Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Optical Emission Diagnostics of H2+CH4 50‐Hz–13.56‐MHz Plasmas for Chemical Vapor Deposition
Journal of Applied Physics
Astronomy
Physics
Diamond Film Grown by Microwave Plasma-Assisted Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Spatial Distribution of Plasma Parameters in Microwave Plasma Chemical Vapor Deposition
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Detailed Study of the Plasma-Activated Catalytic Generation of Ammonia in N2-H2 Plasmas
Journal of Applied Physics
Astronomy
Physics
Plasma-Enhanced Chemical Vapor Deposition of Boron Nitride Thin Films From B2H6–H2–NH3 and B2H6–N2 Gas Mixtures
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
