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Publications by Masamitsu Shirai

Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2019English

Synthesis of Thiophene Oligomers by Photo-Irradiation

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2012English

Photochemistry of Imino Sulfonate Compounds and Their Application to Chemically Amplified Resists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1990English

Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrene Derivatives by 146nm Light.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2000English

Non-Ionic Photoacid Generators Sensitive to 365nm Light-Synthesis and Applications to Photocrosslinking Systems-

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2007English

Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-Situ FT-IR Spectroscopy.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2002English

Photocrosslinking System Based on Poly(vinyl Phenol) and Fluorene Derivatives With Epoxy Unit Using Photoacid and Photobase Generators.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2001English

Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2000English

Effect of Spacer Unit on Photo-Initiated Thermal Crosslinking of Polymers Having Carbamoyloxyimino Groups in Side-Chains

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2007English

Photocuring Systems Using Quaternary Ammonium Thiocyanates.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2002English

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