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Publications by Masaru Sasago
O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography
Polymer Journal
Polymers
Materials Chemistry
Plastics
Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Diffusion Kinetic of Vapor-Phase Silylation Process for ArF Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
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