Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Masataka Narita
Effective Sticking Coefficient Measurement of Radicals for A-SiN:H Film Growth in Plasma CVD
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Related publications
Effects of Ion Bombardment During A-Si Based Film Growth in Plasma CVD
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Hard Carbon Film Coating by Plasma CVD.
SHINKU
Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
Reduced Order Based Compensator Control of Thin Film Growth in a CVD Reactor
Substrate Temperature Measurement and Control During Thermal Plasma CVD
Process Optimization of Graphene Growth in a Roll-To-Roll Plasma CVD System
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.
SHINKU
Growth of Diamond Thin Films Using a Simple Microwave Plasma CVD Apparatus.
SHINKU
Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation
