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Publications by Massimo Gentili

Fabrication of Optical Wave-Guides in Silica-On-Silicon by Nickel Electroplating and Conventional Reactive Ion Etching

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

English

Related publications

Magneto-Optical Disk Substrate Prepared by Reactive Ion Etching.

English

Reactive Ion Etching: Optimized Diamond Membrane Fabrication for Transmission Electron Microscopy

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Electronic Engineering

Condensed Matter Physics

Instrumentation

Materials Chemistry

Magnetic Materials

Process Chemistry

English

Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching

Advances in Materials Science and Engineering

Materials Science

English

Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for MEMS Application

English

The Black Silicon Method II:The Effect of Mask Material and Loading on the Reactive Ion Etching of Deep Silicon Trenches

Microelectronic Engineering

Electronic Engineering

Condensed Matter Physics

Molecular Physics,

Magnetic Materials

English

3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching

Advanced Functional Materials

Materials Science

Condensed Matter Physics

Electrochemistry

Magnetic Materials

English

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Electrochemical and Solid-State Letters

English

Fabrication of Photonic Crystal Structures by Focused Ion Beam Etching

English

Enhanced Electrochemical Etching of Ion Irradiated Silicon by Localized Amorphization

Applied Physics Letters

English