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Publications by Meysam Zarchi
Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure
Metallurgical and Materials Engineering
Alloys
Metals
Mechanical Engineering
Related publications
High-Performance Thin H:SiON OLED Encapsulation Layer Deposited by PECVD at Low Temperature
RSC Advances
Chemistry
Chemical Engineering
Investigation of Optical Properties of Silicon Oxynitride Films Deposited by RF PECVD Method
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Effect of Ion Bombardment on the Chemical and the Mechanical Properties of Silicon-Nitride Thin Films Deposited by Using PECVD With SiH4/NH3/Ar Gases at Low Temperature
Journal of the Korean Physical Society
Astronomy
Physics
Highly Conductive P-Type Nanocrystalline Silicon Films Deposited by RF-PECVD Using Silane and Trimethylboron Mixtures at High Pressure
Vacuum
Surfaces
Instrumentation
Coatings
Condensed Matter Physics
Films
Enhanced Optical Properties of Chemical Vapor Deposited Single Crystal Diamond by Low-Pressure/High-Temperature Annealing
Proceedings of the National Academy of Sciences of the United States of America
Multidisciplinary
Effect of Hydrogen Content and Bonding Environment on Mechanical Properties of Hydrogenated Silicon Films Deposited by High-Frequency PECVD Process
ISRN Nanomaterials
Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for MEMS Application
Low-Temperature Deposition of Silicon Dioxide Films in High-Density Plasma
Semiconductor Physics, Quantum Electronics and Optoelectronics
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
