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Publications by Mitsuo. SHIMOZUMA
Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.
SHINKU
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Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation
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Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.
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High‐rate, Low‐temperature Deposition of Multifunctional Nano‐crystalline Silicon Nitride Films
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