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Publications by Naoki Matsuzuka

Algorithm to Derive Optimal Mask and Movement Patterns in Moving Mask Deep X-Ray Lithography (M2DXL)

IEEJ Transactions on Sensors and Micromachines

Electronic Engineering

Mechanical Engineering

English

Related publications

Validation of X-Ray Lithography and Development Simulation System for Moving Mask Deep X-Ray Lithography

Journal of Microelectromechanical Systems

Electronic Engineering

Mechanical Engineering

English

Nano-Crystalline Diamond Films for X-Ray Lithography Mask

English

Overcoming Mask Blank Defects in EUV Lithography

English

X-Ray Lenses Fabricated by Deep X-Ray Lithography

English

New Illumination Technology for Mask Aligner Lithography

Optik & Photonik

English

Fabricating Needle Arrays With a Gray-Scale X-Ray Mask

English

Phase-Shift Mask Issues for 193-Nm Lithography

English

22X Mask Cleaning Effects on EUV Lithography Process and Lifetime

English

Progress in Spin-On Hard Mask Materials for Advanced Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English