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Publications by Noboru TAKASU
Development of Lithography Based on Excimer Laser.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
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Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
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Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
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Simulated Performance of High Na Excimer Laser Stepper With Chromatic Lens Design for 0.25.MU.m LITHOGRAPHY.
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Evaluation of Optical Characteristics in Deep Ultraviolet Region. Measurement of Optical Elements Used for Excimer Laser Lithography.
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Coronary Excimer Laser Angioplasty.
Circulation
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Thermal Effect of Excimer Laser Blade on Hard Biotissue
THE JOURNAL OF JAPAN SOCIETY FOR LASER SURGERY AND MEDICINE
Excimer Laser and Femtosecond Laser in Ophthalmology
Femtosecond Laser Nonlinear Lithography
