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Publications by Noriaki ODA
Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.
SHINKU
A State of the Art Multilevel Interconnect Technology and the Future Prospects
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Related publications
Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.
SHINKU
Hard Carbon Film Coating by Plasma CVD.
SHINKU
Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
Low Temperature Deposition of SiNx Thin Films by the LPCVD Method
Croatica Chemica Acta
Chemistry
Electronic Transport in Low Temperature Nanocrystalline Silicon Thin-Film Transistors Obtained by Hot-Wire CVD
Journal of Non-Crystalline Solids
Condensed Matter Physics
Materials Chemistry
Optical
Magnetic Materials
Composites
Electronic
Ceramics
Low-Temperature Deposition of Silicon Nitride Films by a Cat-CVD Technique-Gas-Phase Diagnoses and Evaluation of Film Properties-
Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Room Temperature Sputter-Deposited Co-Cr Film
Journal of the Magnetics Society of Japan
Low-Temperature Atmospheric Pressure Plasma-Enhanced CVD of Nanocomposite Coatings “Molybdenum Disulfide (Filler)-Silicon Oxide (Matrix)”
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
Low-Temperature Thermal CVD of Superblack Carbon Nanotube Coatings
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
