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Publications by Omakaram Nalamasu

T-Boc Based Resists: A Polymeric Platform for .LEQ.0.25.MU.m Lithographic Technologies.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Related publications

Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Use of Supramolecular Assemblies as Lithographic Resists

Angewandte Chemie

English

Chemically Amplified Resists. III. The Final Phenolic Product Formation Mechanism From T-Boc.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists

English

Study of PAG Size Effect on Lithographic Performance of 157nm Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Simulated Performance of High Na Excimer Laser Stepper With Chromatic Lens Design for 0.25.MU.m LITHOGRAPHY.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Emergent Soft Lithographic Tools for the Fabrication of Functional Polymeric Microstructures

Theoretical Chemistry

Molecular Physics,

English

A Scalable WebRTC Platform Based on Open Technologies

English

Special Section Guest Editorial: Alternative Lithographic Technologies

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Electronic Engineering

Condensed Matter Physics

Mechanical Engineering

Molecular Physics,

Magnetic Materials

English