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Publications by Osamu TABATA
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Down-Sizing in Analytical Chemistry. Fabrication of a Micro-Channel Chip for Electrophoresis by Using a Photosensitive Epoxy Resin as an Etching Mask.
Bunseki Kagaku
Analytical Chemistry
Related publications
Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
Preparation of Cubic Boron Nitride Thin Film by the Helicon Wave Plasma Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
Sensors and Materials
Materials Science
Instrumentation
Deposition of Titanium Nitride by Vapor Phase Reaction
NIPPON KAGAKU KAISHI
Plasma-Enhanced Chemical Vapor Deposition of Boron Nitride Thin Films From B2H6–H2–NH3 and B2H6–N2 Gas Mixtures
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Preparation of Diamond Like Carbon (DLC) Films by Hot Cathode Penning Ionization Gauge Type Plasma-Enhanced Chemical Vapor Deposition Method
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
