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Publications by Osamu Yokokoji
A New Monocyclic Fluoropolymer for 157-Nm Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
New Amorphous Fluoropolymers of Tetrafluoroethylene With Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 Nm
Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography
Fluorinated Chemically Amplified Dissolution Inhibitors for 157 Nm Nanolithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Nanopatterning With 248 Nm Photolithography by Photostabilizing Bilayer Photoresists
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
A New Sol-Gel Process for Fabricating TiO2 Photoresists
SPIE Newsroom
Peptide Photodissociation With 157 Nm Light in a Commercial Tandem Time-Of-Flight Mass Spectrometer
Analytical Chemistry
Analytical Chemistry
Ablation-Induced Stresses in Fused Silica by 157-Nm F2-Laser Irradiation
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
O(3PJ) Formation and Desorption by 157-Nm Photoirradiation of Amorphous Solid Water
Journal of Chemical Physics
Medicine
Theoretical Chemistry
Astronomy
Physics
Physical
