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Publications by P R M Kleuskens

Quality Improvement of Plasma-Beam-Deposited Amorphous Hydrogenated Carbon With Higher Growth Rate

Plasma Sources Science and Technology

Condensed Matter Physics

English

Related publications

Controlled Fluoridation of Amorphous Carbon Films Deposited at Reactive Plasma Conditions

Materials Science-Poland

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

Interfacial Electrical Properties of Ion-Beam Sputter Deposited Amorphous Carbon on Silicon

IEEE Electron Device Letters

Electronic Engineering

Magnetic Materials

English

Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

International Journal of Photoenergy

Materials Science

Renewable Energy

Molecular Physics,

the Environment

English

In Situ Single Wavelength Ellipsometry Studies of High Rate Hydrogenated Amorphous Silicon Growth Using a Remote Expanding Thermal Plasma

Journal of Applied Physics

English

A Hard Graphitelike Hydrogenated Amorphous Carbon Grown at High Deposition Rate (>15nm∕s)

Applied Physics Letters

English

Plasma Diagnostics of Rf Discharges Used for the Deposition of Hydrogenated Amorphous Carbon Coatings

Journal de Physique III

English

Plasma Enhanced-Chemical Vapour Deposition of Scuff-Resistant Hydrogenated Amorphous Carbon Coatings on C100 Steel

Journal of Surface Engineered Materials and Advanced Technology

English

Raman and Infrared Modes of Hydrogenated Amorphous Carbon Nitride

Journal of Applied Physics

English

Properties of Ultra Fast Deposited Diamond-Like Hydrogenated Carbon Films

Acta Physica Polonica A

English