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Publications by R. Flückiger

Electrical Properties and Degradation Kinetics of Compensated Hydrogenated Microcrystalline Silicon Deposited by Very High‐frequency‐glow Discharge

Journal of Applied Physics

English

Related publications

Effect of Hydrogen Content and Bonding Environment on Mechanical Properties of Hydrogenated Silicon Films Deposited by High-Frequency PECVD Process

ISRN Nanomaterials

English

Hydrogenated Amorphous Silicon Deposited by High Pressure Sputtering for HIT Solar Cells

English

Microcrystalline Silicon Thin-Film Transistors Operating at Very High Frequencies

Applied Physics Letters

English

Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Prepared by Plasma CVD Method.

Journal of Society of Materials Engineering for Resources of Japan

English

Amorphous Silicon Film Prepared by a Glow Discharge and Its Applications

English

Structural and Electrical Properties of Titanium-Nickel Films Deposited Onto Silicon Substrates

Materials Research Society Symposium - Proceedings

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

Impact of Secondary Gas-Phase Reactions on Microcrystalline Silicon Solar Cells Deposited at High Rate

Applied Physics Letters

English

Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

International Journal of Photoenergy

Materials Science

Renewable Energy

Molecular Physics,

the Environment

English

Optical Properties of Hydrogenated Amorphous Silicon

Journal of Applied Physics

English