Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by R.R. KUNZ
RESOLUTION AND ETCH RESISTANCE OF a FAMILY OF 193nm POSITIVE RESISTS
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Dry Etch Characteristics of Silylated Deep UV Resists in Novel Plasma Configurations.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Narrow Features in Metals at the Interfaces Between Different Etch Resists
Applied Physics Letters
Astronomy
Physics
Dissolution Inhibition in Positive Novolak Resists
Molecular Glass Resists for High-Resolution Patterning
Platinum and Palladium Oxalates: Positive-Tone Extreme Ultraviolet Resists
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
CR-73: A New, High-Resolution Plastic Track-Etch Detector
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
High Energy Physics
Instrumentation
Nuclear
Resistance to Sexual Assault: Who Resists and What Happens?
American Journal of Public Health
Environmental
Public Health
Occupational Health
Diffusion of Photogenerated Acid in Chemical Amplification Positive Deep UV Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
