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Publications by Shigeo Irie
A New Monocyclic Fluoropolymer for 157-Nm Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
New Amorphous Fluoropolymers of Tetrafluoroethylene With Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 Nm
Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography
Fluorinated Chemically Amplified Dissolution Inhibitors for 157 Nm Nanolithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Nanopatterning With 248 Nm Photolithography by Photostabilizing Bilayer Photoresists
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
A New Sol-Gel Process for Fabricating TiO2 Photoresists
SPIE Newsroom
Peptide Photodissociation With 157 Nm Light in a Commercial Tandem Time-Of-Flight Mass Spectrometer
Analytical Chemistry
Analytical Chemistry
Ablation-Induced Stresses in Fused Silica by 157-Nm F2-Laser Irradiation
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
O(3PJ) Formation and Desorption by 157-Nm Photoirradiation of Amorphous Solid Water
Journal of Chemical Physics
Medicine
Theoretical Chemistry
Astronomy
Physics
Physical
