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Publications by Shinji Kishimura
Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Development of Lithography Based on Excimer Laser.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography
Polymer Journal
Polymers
Materials Chemistry
Plastics
Evaluation of LB Films for Excimer Laser and X-Ray Resists
The Journal of the Institute of Television Engineers of Japan
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of Optical Characteristics in Deep Ultraviolet Region. Measurement of Optical Elements Used for Excimer Laser Lithography.
Journal of the Spectroscopical Society of Japan
Copolymer Sequence Distribution With Chiral Stereoregularity and Its Application to Poly(acrylonitrile-Co-Methacrylonitrile)
Polymer Journal
Polymers
Materials Chemistry
Plastics
Magnetostriction Behaviors of Single- And Poly-Crystalline Ni/Ni-Co Bi-Layer Films
Journal of the Magnetics Society of Japan
Electronic Engineering
Condensed Matter Physics
Instrumentation
Optical
Electrical
Magnetic Materials
Electronic
Simulated Performance of High Na Excimer Laser Stepper With Chromatic Lens Design for 0.25.MU.m LITHOGRAPHY.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
