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Publications by Shoichi MOCHIZUKI
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
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Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
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Preparation of Cubic Boron Nitride Thin Film by the Helicon Wave Plasma Enhanced Chemical Vapor Deposition
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Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
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Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition
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Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
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Deposition of Titanium Nitride by Vapor Phase Reaction
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Plasma-Enhanced Chemical Vapor Deposition of Boron Nitride Thin Films From B2H6–H2–NH3 and B2H6–N2 Gas Mixtures
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Preparation of Diamond Like Carbon (DLC) Films by Hot Cathode Penning Ionization Gauge Type Plasma-Enhanced Chemical Vapor Deposition Method
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Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition
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