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Publications by Shwang-Ming Jeng
Physical and Electrical Characteristics of F- And C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Related publications
Dielectric Breakdown in Chemical Vapor Deposited Hexagonal Boron Nitride
Electrical Conductivity, Dielectric Constant and Phase Transitions in Pure and Doped Diammonium Hydrogen Phosphate
Journal of Physics Condensed Matter
Materials Science
Condensed Matter Physics
Metal Drift Induced Electrical Instability of Porous Low Dielectric Constant Film
Journal of Applied Physics
Astronomy
Physics
Structural and Surface Analysis of Chemical Vapor Deposited Boron Doped Aluminum Nitride Thin Film on Aluminum Substrates
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Chemical Etching and Plating Characteristics of Vapor Deposited Copper Film Using High Purity Copper Sources.
Journal of the Surface Finishing Society of Japan
High Temperature Dielectric Properties of (BxNyOz) Thin Films Deposited Using Ion Source Assisted Physical Vapor Deposition
Journal of Advanced Dielectrics
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Composites
Electronic
Ceramics
Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO
Chemical-Vapor Deposition of Complex Oxides: Materials and Process Development
Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
