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Publications by Takao Iwayanagi

Diffusion of Photogenerated Acid in Chemical Amplification Positive Deep UV Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

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Chemical Amplification Resists: Laboratory Curiosity to Paradigm

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Dry Etch Characteristics of Silylated Deep UV Resists in Novel Plasma Configurations.

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Positive Chemically Amplified Resists Using Naphthoquinone Diazides as Photo-Acid-Generators.

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Dissolution Inhibition in Positive Novolak Resists

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Uv, X-Ray and E-Beam Sensitive Plasma Polymerlized Resists.

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Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists

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Platinum and Palladium Oxalates: Positive-Tone Extreme Ultraviolet Resists

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New Polymers With Acid Labile Crosslinked Units and Their Performance in Deep-Uv Photoresists

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Time Delay Effect on a Positive Deep UV Resist Using Partially Tetrahydropyranyl-Protected Polyvinylphenol.

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