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Publications by Takayoshi Shimura
Heavy Arsenic Doping of Silicon Grown by Atmospheric Pressure Selective Epitaxial Chemical Vapor Deposition
Science and Technology of Advanced Materials
Materials Science
Related publications
Reduction of Doping and Trap Concentrations in 4H–SiC Epitaxial Layers Grown by Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Defects in Silicon Carbide Grown by Fluorinated Chemical Vapor Deposition Chemistry
Physica B: Condensed Matter
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Electronic
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Effect of Sn Doping on Structural Properties of ZnO Thin Films Prepared by Atmospheric Pressure Chemical Vapor Deposition Method
Diyala Journal For Pure Science
Doping Graphene Transistors Using Vertical Stacked Monolayer WS2 Heterostructures Grown by Chemical Vapor Deposition
Interstitial Boron-Doped TiO2Thin Films: The Significant Effect of Boron on TiO2Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition
ACS Applied Materials & Interfaces
Medicine
Materials Science
Nanotechnology
Nanoscience
Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources
Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
Sensors and Materials
Materials Science
Instrumentation
