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Publications by Tatsuhiko Ihara
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Mechanical Properties of B(C,N) Thin Film by Plasma-Assisted Chemical Vapor Deposition.
SHINKU
High Speed Deposition of Y2O3 Films by Laser-Assisted Chemical Vapor Deposition
Materials Transactions
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Preparation and Characterization of ITO Thin Films Deposition by Ion Beam Assisted Deposition
Journal of Korean Institute of Metals and Materials
Surfaces
Alloys
Metals
Simulation
Optical
Magnetic Materials
Films
Modeling
Coatings
Electronic
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
Journal of Applied Sciences
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
High Temperature Dielectric Properties of (BxNyOz) Thin Films Deposited Using Ion Source Assisted Physical Vapor Deposition
Journal of Advanced Dielectrics
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Composites
Electronic
Ceramics
