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Publications by Teiichi Kimura
High Speed Deposition of Y2O3 Films by Laser-Assisted Chemical Vapor Deposition
Materials Transactions
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Related publications
Plasmon-Assisted Chemical Vapor Deposition
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A High Temperature, Plasma-Assisted Chemical Vapor Deposition System
Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Chemical Vapor Deposition of Azidoalkylsilane Monolayer Films
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
Excimer-Laser-Induced Chemical Vapor Deposition of Copper Films From Copper Trifluoroacetylacetonate
Le Journal de Physique IV
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
