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Publications by Toshiharu Matsuzawa
Study of Proximity Lithography Simulations Using Actual Measurements of Dissolution Rates in Thick Resist Films
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
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Evaluation of EUV Resist Performance Using Interference Lithography
Absolute Measurements of Radiation Damage in Nanometer-Thick Films
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Radiation
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Radiological
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Medicine
Occupational Health
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
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Transient Temperature Measurements of Resist Heating Using Nanothermocouples
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Metallic Resist for Phase-Change Lithography
Scientific Reports
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Reducing Proximity Effects in Optical Lithography
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
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In Situ Analysis of the EUV Resist Pattern Formation During the Resist Dissolution Process
Journal of Photopolymer Science and Technology
Organic Chemistry
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Immersion Lithography: Topcoat and Resist Processes
SPIE Newsroom
SEM Imaging of Resist Patterns Fabricated Through Imprint Lithography Techniques
Microscopy and Microanalysis
Instrumentation
