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Publications by Toyofumi Shinozuka
Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrene Derivatives by 146nm Light.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-Situ FT-IR Spectroscopy.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
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