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Publications by V. Au

Thickness-Dependent Stress in Plasma-Deposited Silicon Dioxide Films

Journal of Applied Physics

English

Related publications

Low-Temperature Deposition of Silicon Dioxide Films in High-Density Plasma

Semiconductor Physics, Quantum Electronics and Optoelectronics

Electronic Engineering

Molecular Physics,

Magnetic Materials

English

Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition

Journal of Applied Sciences

English

Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition

Materials Research Society Symposium - Proceedings

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

Depth-Dependent Spectroscopic Defect Characterization of the Interface Between Plasma-Deposited SiO2 and Silicon

Applied Physics Letters

English

Chacterization of Titanium Silicon Nitride Films Deposited by PVD

Instrumentation

Condensed Matter Physics

English

Optimization of in Situ Plasma Oxidation of Metallic Gadolinium Thin Films Deposited by High Pressure Sputtering on Silicon

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Electronic Engineering

Condensed Matter Physics

Instrumentation

Materials Chemistry

Magnetic Materials

Process Chemistry

English

Laser Desorption/Ionization Fourier Transform Mass Spectrometry of Thin Films Deposited on Silicon by Plasma Polymerization of Acetylene

Journal of the American Society for Mass Spectrometry

Structural Biology

English

Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure

Metallurgical and Materials Engineering

Mechanical Engineering

English

Silicon Oxide Thickness-Dependent Growth of Carbon Nanotubes

Applied Physics Letters

English