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Publications by Vitor R. Manfrinato

1-Nm Si Patterning: Patterning Si at the 1 Nm Length Scale With Aberration-Corrected Electron-Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019)

Advanced Functional Materials
Materials ScienceCondensed Matter PhysicsElectrochemistryNanoscienceOpticalBiomaterialsMagnetic MaterialsNanotechnologyChemistryElectronic
2019English

Anisotropic Etching and Nanoribbon Formation in Single-Layer Graphene

Nano Letters
Materials ScienceCondensed Matter PhysicsMechanical EngineeringNanoscienceBioengineeringNanotechnologyChemistry
2009English

Related publications

Colloidal Lithography: Advanced Colloidal Lithography Beyond Surface Patterning (Adv. Mater. Interfaces 1/2017)

Advanced Materials Interfaces
Mechanics of MaterialsMechanical Engineering
2017English

Sub-100 Nm Patterning of Supported Bilayers by Nanoshaving Lithography

English

Pressure Sensors: Nanosphere Lithography for Sub-10-Nm Nanogap Electrodes (Adv. Electron. Mater. 1/2017)

Advanced Electronic Materials
OpticalElectronicMagnetic Materials
2017English

Patterning of 100 Nm Features Using X-Ray Lithography.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1997English

Masthead: (Adv. Funct. Mater. 52/2019)

Advanced Functional Materials
Materials ScienceCondensed Matter PhysicsElectrochemistryNanoscienceOpticalBiomaterialsMagnetic MaterialsNanotechnologyChemistryElectronic
2019English

Contents: (Adv. Funct. Mater. 52/2019)

Advanced Functional Materials
Materials ScienceCondensed Matter PhysicsElectrochemistryNanoscienceOpticalBiomaterialsMagnetic MaterialsNanotechnologyChemistryElectronic
2019English

Contents: (Adv. Funct. Mater. 1/2019)

Advanced Functional Materials
Materials ScienceCondensed Matter PhysicsElectrochemistryNanoscienceOpticalBiomaterialsMagnetic MaterialsNanotechnologyChemistryElectronic
2019English

Patterning Poly(3-Hexylthiophene) in the Sub-50-Nm Region by Nanoimprint Lithography

IEEE Transactions on Nanotechnology
Electronic EngineeringNanotechnologyComputer Science ApplicationsElectricalNanoscience
2011English

PAG Incorporated Polymeric Resists for Sub-100 Nm Patterning at 193 Nm Exposure

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

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