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Publications by W. M. M. Kessels

Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films

Journal of the Electrochemical Society

Condensed Matter Physics

Electrochemistry

Materials Chemistry

Magnetic Materials

Renewable Energy

the Environment

English

Initial Stage of Atomic Layer Deposition of 2d-MoS2 on SiO2 Surface: A DFT Study

Physical Chemistry Chemical Physics

Theoretical Chemistry

English

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Status and Prospects of Al2O3-Based Surface Passivation Schemes for Silicon Solar Cells

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Substrate-Biasing During Plasma-Assisted Atomic Layer Deposition to Tailor Metal-Oxide Thin Film Growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Dielectric Material Options for Integrated Capacitors

ECS Journal of Solid State Science and Technology

Magnetic Materials

English

Surface Passivation by Al2O3 and A-SiNx: H Films Deposited on Wet-Chemically Conditioned Si Surfaces

ECS Journal of Solid State Science and Technology

Magnetic Materials

English

Quasi-Ice Monolayer on Atomically Smooth AmorphousSiO2at Room Temperature Observed With a High-Finesse Optical Resonator

Physical Review Letters

English

Temperature Dependence of the Surface Roughness Evolution During Hydrogenated Amorphous Silicon Film Growth

Applied Physics Letters

English

High Efficiency N-Type Si Solar Cells on Al2O3-Passivated Boron Emitters

Applied Physics Letters

English