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Publications by Wang Yueh
PAG Incorporated Polymeric Resists for Sub-100 Nm Patterning at 193 Nm Exposure
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Sub-100 Nm Patterning of Supported Bilayers by Nanoshaving Lithography
Adhesion Enhancement of Norbornene Polymers With Lithocholate Substituents for 193-Nm Resists
Polymer Journal
Polymers
Materials Chemistry
Plastics
Photodissociation of Isobutene at 193 Nm
Physical Chemistry Chemical Physics
Theoretical Chemistry
Astronomy
Physics
Physical
Optimum TiSi2Ohmic Contact Process for Sub-100 Nm Devices
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Patterning of 100 Nm Features Using X-Ray Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Photodissociation Dynamics of Benzyl Alcohol at 193 Nm
Journal of Chemical Physics
Medicine
Theoretical Chemistry
Astronomy
Physics
Physical
Phase-Shift Mask Issues for 193-Nm Lithography
Hyper High Numerical Aperature Achromatic Interferometer for Immersion Lithography at 193 Nm
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm
