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Publications by Warren Montgomery

Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

Related publications

Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography

Molecular Physics,

English

Towards 11nm Half-Pitch Resolution for a Negative-Tone Chemically Amplified Molecular Resist Platform for Extreme-Ultraviolet Lithography

English

Guest Editorial: Extreme Ultraviolet Interference Lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Electronic Engineering

Condensed Matter Physics

Mechanical Engineering

Molecular Physics,

Magnetic Materials

English

Comparison of Various Lithography Strategies for the 65- And 45-Nm Half Pitch Using Simulation

English

Development of Compact Extreme Ultraviolet Interferometry for On-Line Test of Lithography Cameras

English

Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography

Applied Physics Letters

English

Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography

English

Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography

Physics of Plasmas

Condensed Matter Physics

English

Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English