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Publications by Yoshihiro KAIZUMA
Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
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Hard Carbon Film Coating by Plasma CVD.
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Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation
Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
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Low-Temperature Atmospheric Pressure Plasma-Enhanced CVD of Nanocomposite Coatings “Molybdenum Disulfide (Filler)-Silicon Oxide (Matrix)”
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Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.
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Preparation and Properties of Black Anodic Oxide Film on Aluminium by CVD Method
Journal of the Japan Society of Colour Material
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