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Publications by Yoshiyuki Tani

O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography

Polymer Journal

Materials Chemistry

English

Related publications

Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Development of Lithography Based on Excimer Laser.

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Mechanical Engineering

English

Computer Simulation for UV-preionized Discharge KrF Laser

The Review of Laser Engineering

English

Evaluation of Optical Characteristics in Deep Ultraviolet Region. Measurement of Optical Elements Used for Excimer Laser Lithography.

Journal of the Spectroscopical Society of Japan

English

Micromachining of Polyurethane (PU) Polymer Using a KrF Excimer Laser (248nm)

Applied Surface Science

Condensed Matter Physics

English

New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Pulsed Excimer (KrF) Laser Melting of Amorphous and Crystalline Silicon Layers

Journal of Applied Physics

English

Metallic Resist for Phase-Change Lithography

Scientific Reports

Multidisciplinary

English

Evaluation of Resist Capability for EUV Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English