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Publications by Yoshiyuki Yokoyama
Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure With .DELTA.-Hydroxy Acid.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Metallic Resist for Phase-Change Lithography
Scientific Reports
Multidisciplinary
Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Diffusion Kinetic of Vapor-Phase Silylation Process for ArF Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Electron Beam Lithography Using GaAs Oxidized Resist for GaAs/AlGaAs Ultrafine Structure Fabrication.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of EUV Resist Performance Using Interference Lithography
Deformation Analysis of ArF Resist Pattern by Using AFM
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Highly-Efficient Photoacid Generators for ArF Resist.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
