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Publications by Yuki Kanetani

Interface Properties of SiOxNy Layer on Si Prepared by Atmospheric-Pressure Plasma Oxidation-Nitridation

Nanoscale Research Letters

Materials Science

Condensed Matter Physics

English

Related publications

Phenomenological Theory on Si Layer-By-Layer Oxidation With Small Interfacial Islands

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

English

Solvated Electrons at the Atmospheric Pressure Plasma–water Anodic Interface

Journal of Physics D: Applied Physics

Condensed Matter Physics

Magnetic Materials

English

Properties of Plasma Sterilizer Using Non-Thermal Atmospheric-Pressure Biocompatible Plasma

English

Emission Properties of an Atmospheric Pressure Argon Plasma Jet Excited by Barrier Discharge

Ukrainian Journal of Physics

English

High-Rate Growth of Defect-Free Epitaxial Si at Low Temperatures by Atmospheric Pressure Plasma CVD

English

Effect of Sn Doping on Structural Properties of ZnO Thin Films Prepared by Atmospheric Pressure Chemical Vapor Deposition Method

Diyala Journal For Pure Science

English

Interface Properties of MOS Structures Prepared by Reactive Sputtering

English

Physical Properties and Interface Studies of YBa2Cu3O7 Thin Films Deposited by Laser Ablation on Si (111) With Buffer Layer

Journal of the Less Common Metals

English

The Effect of Different Carrier Gases and Channel Thicknesses on the Characteristics of ZnO TFTs Prepared by Atmospheric Pressure Plasma Jet

English