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Publications by Yukimi Ichikawa
Effective Sticking Coefficient Measurement of Radicals for A-SiN:H Film Growth in Plasma CVD
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Related publications
Effects of Ion Bombardment During A-Si Based Film Growth in Plasma CVD
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Hard Carbon Film Coating by Plasma CVD.
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Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
Reduced Order Based Compensator Control of Thin Film Growth in a CVD Reactor
Substrate Temperature Measurement and Control During Thermal Plasma CVD
Process Optimization of Graphene Growth in a Roll-To-Roll Plasma CVD System
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.
SHINKU
Growth of Diamond Thin Films Using a Simple Microwave Plasma CVD Apparatus.
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Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation
