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Publications by Yuuki ISHIDA
Recent Developments in the High-Rate Growth of SiC Epitaxial Layers by the Chemical Vapor Deposition Method
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Related publications
Reduction of Doping and Trap Concentrations in 4H–SiC Epitaxial Layers Grown by Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Thermal Plasma Chemical Vapor Deposition of SiC.
ISIJ International
Mechanics of Materials
Alloys
Materials Chemistry
Metals
Mechanical Engineering
Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
High-Resistive Layers Obtained Through Periodic Growth and in Situ Annealing of InGaN by Metalorganic Chemical Vapor Deposition
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Preparation of Epitaxial Bi4Ti3O12 Films on Sapphire Substrates by Chemical Vapor Deposition.
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Alloys
Industrial
Mechanical Engineering
Metals
Materials Chemistry
Manufacturing Engineering
Epitaxial Lateral Overgrowth of A-Plane GaN by Metalorganic Chemical Vapor Deposition
Journal of Applied Physics
Astronomy
Physics
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Epitaxial Growth of BiFeO3 Films on TiN Under Layers by Sputtering Deposition
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Vapor Phase Epitaxial Growth of AlAs by Chloride Transport Method
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
