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Publications by Zachary M. Fresco
Fluorinated Chemically Amplified Dissolution Inhibitors for 157 Nm Nanolithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Towards Surface Growth Lithography Using Polymer Bound Photoactive Acid Generators
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
New Amorphous Fluoropolymers of Tetrafluoroethylene With Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 Nm
High Sensitivity Nonchemically Amplified Molecular Resists Based on Photosensitive Dissolution Inhibitors
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
A New Monocyclic Fluoropolymer for 157-Nm Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography
Chemically-Driven Convective Dissolution
Physical Chemistry Chemical Physics
Theoretical Chemistry
Astronomy
Physics
Physical
Highly-Sensitive Biosensors With Chemically-Amplified Responses
Electrochemistry
Electrochemistry
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Topographically Flat, Chemically Patterned PDMS Stamps Made by Dip-Pen Nanolithography
Angewandte Chemie - International Edition
Catalysis
Chemistry
A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
