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Publications in Films

The High Temperature Vibrational Partition Function of Stretching of Triatomic Systems

Plasma Chemistry and Plasma Processing
SurfacesCondensed Matter PhysicsChemical EngineeringFilmsCoatingsChemistry
2020English

Improved Self-Gain in Deep Submicrometer Strained Silicon–germanium pMOSFETs With HfSiOx/TiSiN Gate Stacks

Microelectronic Engineering
SurfacesElectronic EngineeringCondensed Matter PhysicsElectronicMolecular Physics,NanoscienceOpticalElectricalAtomicMagnetic MaterialsFilmsNanotechnologyOpticsCoatings
2010English

Compressible Fluid Model for Hydrodynamic Lubrication Cavitation

Journal of Tribology
Mechanics of MaterialsSurfacesMechanical EngineeringInterfacesFilmsCoatings
2013English

Revisiting the Growth Mechanism of Atomic Layer Deposition of Al2O3: A Vibrational Sum-Frequency Generation Study

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2017English

Direct Wafer Bonding of Highly Conductive GaSb/GaInAs and GaSb/GaInP Heterojunctions Prepared by Argon-Beam Surface Activation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2016English

Defect Formation During Chlorine-Based Dry Etching and Their Effects on the Electronic and Structural Properties of InP/InAsP Quantum Wells

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2016English

Tributes

Plasma Chemistry and Plasma Processing
SurfacesCondensed Matter PhysicsChemical EngineeringFilmsCoatingsChemistry
2019English

Photoluminescence Characterization of Polythiophene Films Incorporated With Highly Functional Molecules Such as Metallophthalocyanine

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2013English

Review Article: Spectroscopic Microreactors for Heterogeneous Catalysis

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2019English

Fluorocarbon Assisted Atomic Layer Etching of SiO2 Using Cyclic Ar/C4f8 Plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2014English

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