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Publications in Polymers

Chemically Amplified Resists. III. The Final Phenolic Product Formation Mechanism From T-Boc.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Molecular Design of PAC Used for the Positive Photoresists: Optimization of M/a Value Before and After Photolysis.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

A Novel Electron Beam Resist System Acid Catalized Conversion of Poly(di-T-Butoxysiloxane) Into Glass.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Artificial Proteins That Interface Between Biological and Inorganic Materials

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Soluble Polyimides With Polyalicyclic Structure. Part 9. A Polyalicyclic Polyimide Bearing Spiro Structure.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

The Study on Developer Containing Surfactant for ArF Lithography Process

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Novolak Resist Removal Using Laser (266/532nm)

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Side Chain Liquid Crystalline Polyacetylene Derivatives. Synthesis and Properties.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Diphenyliodonium Salts With Diazoxide Group for a Photo-Acid Generator

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English