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Publications in Polymers
Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
193nm Photoresist R&D the Risk & Challenge
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A Study of Photoresist Pattern Freezing for Double Imaging Using 172nm VUV Flood Exposure
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Cohesion Property of Resist Micro Pattern Analyzed by Using Atomic Force Microscope (AFM)
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Effect of Spacer Unit on Photo-Initiated Thermal Crosslinking of Polymers Having Carbamoyloxyimino Groups in Side-Chains
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Outgassing Characteristics of Structural Materials and the Removal of Contaminants From EUVL Masks Using 172-Nm Radiation
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Optical Properties of Polyalicyclic Polyimides.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Second-Harmonic Generation in Langmuir-Blodgett Films of P-Nitroaniline Derivatives.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
The Photopolymer Science and Technology Award
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
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