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Ultra-High Implant Activation Efficiency in GaN Using Novel High Temperature RTP System

Materials Research Society Symposium - Proceedings - United States
doi 10.1557/proc-512-463
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Abstract

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Categories
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
Date

January 1, 1998

Authors
X. A. CaoC. R. AbernathyR. K. SinghS. J. PeartonM. FuV. SarvepalliJ. A. SekharJ. C. ZolperD. J. RiegerJ. HanT. J. DrummondR. J. ShulR. G. Wilson
Publisher

Cambridge University Press (CUP)


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