Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-Ended Poly(.ALPHA.-Methylstyrene).

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.13.211
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Technical Association of Photopolymers, Japan

Related search

Dry Thermal Development of Negative Electron Beam Resist Polystyrene

Advances in Nano Research
Electronic EngineeringMechanical EngineeringOpticsFluid FlowMolecular Physics,OpticalElectricalAtomicMagnetic MaterialsTransfer ProcessesBiotechnologyCompositesElectronicCatalysisCeramics
2013English

Water Soluble and Metal-Containing Electron Beam Resist Poly(sodium 4-Styrenesulfonate)

Materials Research Express
SurfacesAlloysPlasticsPolymersMetalsOpticalBiomaterialsMagnetic MaterialsFilmsCoatingsElectronic
2014English

A Novel Electron Beam Resist System Acid Catalized Conversion of Poly(di-T-Butoxysiloxane) Into Glass.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1992English

Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2005English

Electron Beam Lithography Using GaAs Oxidized Resist for GaAs/AlGaAs Ultrafine Structure Fabrication.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Evaluation of Resist Capability for EUV Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2007English

Sub-10-Nm Structures Written in Ultra-Thin HSQ Resist Layers Using Electron-Beam Lithography

2007English

Evaluation of EUV Resist Performance Using Interference Lithography

2015English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy