Optimization of Thick Negative Photoresist for Fabrication of Interdigitated Capacitor Structures

doi 10.21236/ada615865
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Defense Technical Information Center

Related search

Three Dimensional Structures of Negative-Tone Photoresist by Binary Optics

IEEJ Transactions on Sensors and Micromachines
Electronic EngineeringElectricalMechanical Engineering
2005English

Interferometric Fabrication of Modulated Submicrometer Gratings in Photoresist

Applied Optics
1995English

Non-Standard Patterns for Gridshell Structures: Fabrication and Structural Optimization

Journal of the International Association for Shell and Spatial Structures
BuildingArtsMechanical EngineeringHumanitiesCivilStructural EngineeringConstruction
2017English

Comb Capacitor Structures for Measurement of Post-Processed Layers

2008English

Optimization of Thick Film Resistors for Low Drift

Microelectronics Reliability
SurfacesElectronic EngineeringCondensed Matter PhysicsElectronicMolecular Physics,NanoscienceFilmsOpticalElectricalAtomicMagnetic MaterialsNanotechnologyReliabilitySafetyCoatingsOpticsQualityRisk
1981English

Thick Film Fabrication of Aluminum Nitride Microcircuits. Final Report

1994English

Photolithography of Thick Photoresist Coating in Anisotropically Etched V-Grooves for Electrically Controlled Liquid Crystal Photonic Bandgap Fiber Devices

2009English

Measuring Liquid Drop Properties on Nanoscale 1D Patterned Photoresist Structures

Scientific Reports
Multidisciplinary
2019English

Fabrication of Thick Ceramic Coatings by Means of Cold Spray Process

Journal of The Surface Finishing Society of Japan
2012English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy