Preparation and Characterization of Thin Films for EL Devices.

Hyomen Kagaku
doi 10.1380/jsssj.18.48
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Surface Science Society Japan

Related search

Preparation and Optical Characterization of Cu2ZnGeSe4 Thin Films

Optical Materials
Organic ChemistryElectronic EngineeringSpectroscopyTheoretical ChemistryElectronicMolecular Physics,Inorganic ChemistryOpticalElectricalComputer ScienceMagnetic MaterialsPhysicalOpticsAtomic
2015English

Preparation and Characterization of CoevaporatedCd1−xZnxSAlloy Thin Films

International Journal of Photoenergy
Materials ScienceRenewable EnergyMolecular Physics,SustainabilityAtomicChemistryOpticsthe Environment
2011English

Preparation and Characterization of Silica/Polyamide-Imide Nanocomposite Thin Films

Nanoscale Research Letters
Materials ScienceNanotechnologyCondensed Matter PhysicsNanoscience
2010English

Preparation of Fluoride Thin-Film EL Devices and Their Interface Properties.

Hyomen Kagaku
1994English

Preparation of Oriented PZT Thin Films and the Applications to Micro Piezoelectric Devices

IEEJ Transactions on Sensors and Micromachines
Electronic EngineeringElectricalMechanical Engineering
2007English

Molecular Beam Epitaxy Preparation and in Situ Characterization of FeTe Thin Films

Physical Review Materials
Materials ScienceAstronomyPhysics
2020English

Preparation and Characterization of ITO Thin Films Deposition by Ion Beam Assisted Deposition

Journal of Korean Institute of Metals and Materials
SurfacesAlloysMetalsSimulationOpticalMagnetic MaterialsFilmsModelingCoatingsElectronic
2014English

Synthesis and Characterization of Thin Films.

1986English

Synthesis and Characterization of Zr2Al3C4 Thin Films

Thin Solid Films
SurfacesAlloysOpticalInterfacesMetalsMaterials ChemistryMagnetic MaterialsFilmsCoatingsElectronic
2015English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy