(PDF) Focus Latitude Enhancement of Symmetrical Phase Mask

Focus Latitude Enhancement of Symmetrical Phase Mask Design for Deep Submicron Contact Hole Patterning

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

doi 10.1116/1.1418398

Full Text

Abstract

Available in full text

Date

January 1, 2001

Authors

Chien-Ming Wang

Publisher

American Vacuum Society

Related search

Flying Phase Mask for the Printing of Long Submicron-Period Stitchingless Gratings

Microelectronic Engineering

Electronic Engineering

Condensed Matter Physics

Molecular Physics,

Magnetic Materials

English

Design and Assessment of Symmetrical Phase-Shifting Algorithms

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Pattern Recognition

Molecular Physics,

Computer Vision

Magnetic Materials

English

Directed Self Assembly Materials for Hole Patterning

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Multiple Patterning of Laser Focus Spot Using a Segmented Kinoform Phase Plate

The Review of Laser Engineering

English

Nanoparticle Chemisorption Printing Technique for Conductive Silver Patterning With Submicron Resolution

Nature Communications

Molecular Biology

English

Atomistic Simulations of Deep Submicron Interconnect Metallization

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

Apodized Phase Mask Coronagraphs for Arbitrary Apertures

Astronomy and Astrophysics

Planetary Science

English

Design and Manufacturing of a Multi-Zone Phase-Shifting Coronagraph Mask for Extremely Large Telescopes

Astronomy and Astrophysics

Planetary Science

English

Reliability-Driven CAD System for Deep-Submicron VLSI Circuits

English