Amanote Research
Register
Sign In
Combined Surface-Activated Bonding Technique for Low-Temperature Hydrophilic Wafer Bonding With Interfacial Water Management
doi 10.7567/ssdm.2015.ps-2-6
Full Text
Open PDF
Abstract
Available in
full text
Date
September 29, 2015
Authors
R. He
M. Fujino
A. Yamauchi
T. Suga
Publisher
The Japan Society of Applied Physics
Related search
Low Temperature Bonding for 3D Integration-Surface Activated Bonding (SAB)
Hyomen Kagaku
Low-Temperature Wafer Bonding for Three-Dimensional Wafer-Scale Integration
Permanent Wafer Bonding and Temporary Wafer Bonding / De-Bonding Technology Using Temperature Resistant Polymers
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of Alignment Accuracy for Wafer Bonding Using Moire Technique
Nano-Interfacial Analysis for Tooth Bonding
Annals of Japan Prosthodontic Society
A Comparative Study of the Bonding Energy in Adhesive Wafer Bonding
Journal of Micromechanics and Microengineering
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Nanoscience
Optical
Electrical
Magnetic Materials
Nanotechnology
Electronic
Temporary Wafer Bonding – Key Technologogy for MEMS Devices
Nanoindustry Russia
Silicon Waveguides Produced by Wafer Bonding
Applied Physics Letters
Astronomy
Physics
Low-Temperature Direct Bonding of Flip-Chip Mountable VCSELs With Au-Au Surface Activation
IEEJ Transactions on Sensors and Micromachines
Electronic Engineering
Electrical
Mechanical Engineering