Role of Ge and Si Substrates in Higher-K Tetragonal Phase Formation and Interfacial Properties in Cyclical Atomic Layer Deposition-Anneal Hf1−xZrxO2/Al2O3 Thin Film Stacks
Journal of Applied Physics - United States
doi 10.1063/1.4963166
Full Text
Open PDFAbstract
Available in full text
Date
September 28, 2016
Authors
Publisher
AIP Publishing