Amanote Research

Amanote Research

    RegisterSign In

Pattern Replication in EUV Interference Lithography

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.21.435
Full Text
Open PDF
Abstract

Available in full text

Categories
Organic ChemistryPolymersMaterials ChemistryPlastics
Date

January 1, 2008

Authors
Shota SuzukiYasuyuki FukushimaRyuji OhnishiTakeo WatanabeHiroo Kinoshita
Publisher

Technical Association of Photopolymers, Japan


Related search

Evaluation of EUV Resist Performance Using Interference Lithography

2015English

EUV Lithography

Synchrotron Radiation News
High Energy PhysicsNuclearOpticsAtomicMolecular Physics,
2019English

Progress in EUV Resists Towards High-Na EUV Lithography

2019English

Secondary Electrons in EUV Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2013English

Approach to EUV Lithography Simulation

2011English

EUV Lithography and Exposure Tool.

Journal of Plasma and Fusion Research
2003English

Overcoming Mask Blank Defects in EUV Lithography

SPIE Newsroom
2009English

EUV Light Sources for Next-Gen Lithography

Optics and Photonics News
Electronic EngineeringCondensed Matter PhysicsElectronicMolecular Physics,OpticalElectricalAtomicMagnetic MaterialsOptics
2018English

Progress Overview of EUV Resists Status Towards High-Na EUV Lithography

2019English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy