On the Origins of Structural Defects in BF 2+-Implanted and Rapid-Thermally-Annealed Silicon: Conditions for Defect-Free Regrowth
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms - Netherlands
doi 10.1016/0168-583x(85)90577-4
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Date
March 1, 1985
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Elsevier BV